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Formation kinetics and composition of titanium silicide anodic oxide

✍ Scribed by I. Montero; A. Climent-Font; J. Perrière; D. Levy; J.M. Martinez-Duart

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
465 KB
Volume
38
Category
Article
ISSN
0013-4686

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✦ Synopsis

Ahstrati-The kinetics of the low temperature anodic oxidation of titanium silicide in KNO, solutions in ethylene glycol has been investigated as a function of the anodization current density. A strong influence of the anodic current density in the oxide composition, as determined by Rutherford backscattering spectroscopy is observed. For medium current densities (between 4 and 14mAcm-2) a good quality oxide, composed mainly by a mixture of SiO, and TiO, in the same ratio as the Si/Ti one in the starting silicide is formed. In the case of very low current densities, even after long oxidation times, only a thin SiO, layer is formed. On the other hand, for high current densities, it is detected a significant titanium migration to the surface where this element is lost to the electrolyte.

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