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Oxidation of CVD Si3N4 at 1550° to 1650°C

✍ Scribed by TOSHIO HIRAI; KOICHI NIIHARA; TAKASHI GOTO


Book ID
110814850
Publisher
John Wiley and Sons
Year
1980
Tongue
English
Weight
1015 KB
Volume
63
Category
Article
ISSN
0002-7820

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Plasma-assisted Chemical Vapor Deposition (PACVD) B,C coating and a hybrid PACVD B,C/CVD Si,N, coating were deposited on a two-dimensional C-C substrate. Oxidation behavior of coated and uncoated C-C composites was studied using a thermogravimetric analyzer (TGA) in both the isothermal and kinetic m