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OSL and TL dosimeter characterization of boron doped CVD diamond films

✍ Scribed by J.A.N. Gonçalves; G.M. Sandonato; R. Meléndrez; V. Chernov; M. Pedroza-Montero; E. De la Rosa; R.A. Rodríguez; P. Salas; M. Barboza-Flores

Book ID
108233922
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
145 KB
Volume
27
Category
Article
ISSN
0925-3467

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TL, OSL, Raman spectroscopy and SEM char
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✍ Pedroza-Montero, M. ;Chernov, V. ;Castañeda, B. ;Meléndrez, R. ;Gonçalves, J. A. 📂 Article 📅 2005 🏛 John Wiley and Sons 🌐 English ⚖ 270 KB

## Abstract Hot filament chemically vapor deposited (HFCVD) boron doped diamond films were grown on monocrystalline silicon (111) doped with B/C ratios of 4000, 8000 and 12,000 ppm. Scanning electron micrographs show that the films are composed of well‐faceted microcrystallites ranging in size from