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Optoelectronic properties of TiO2 films prepared by microplasma oxidation method

✍ Scribed by Wang Song; Wu Xiaohong; Qin Wei; Jiang Zhaohua

Book ID
113791413
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
446 KB
Volume
62
Category
Article
ISSN
0167-577X

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Thin films of TiO 2 were grown on n-type Si substrate by thermal oxidation of Ti films deposited by dc sputtering. The phase purity of TiO 2 was confirmed by Raman spectroscopy, and secondary ion mass spectroscopy was used to analyze the interfacial and chemical composition of the TiO 2 thin films.