## Abstract The use of optimal parameter estimation for the online regulation of final etch depth in an ion milling process is described. A modelβbased control system utilizes a 3βD surface evolution model to predict dynamic surface profiles and etch depth. A heterodyne laser interferometer is used
Optimization of the mass reflector parameters for direct ion extraction
β Scribed by Eugene Moskovets
- Publisher
- John Wiley and Sons
- Year
- 2000
- Tongue
- English
- Weight
- 102 KB
- Volume
- 14
- Category
- Article
- ISSN
- 0951-4198
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β¦ Synopsis
The parameters of a mass reflector combined with direct ion extraction are optimized to reduce the time-of-flight spread caused by the initial velocity distribution of ions. Under the assumption that the initial ion velocity distribution is mass independent, one can find the mass range where the spread reaches its minimum by varying the electric field in the ion mirror. The mass dependence of this particular time-of-flight spread can be diminished when the electric field in the ion mirror changes with time. This was theoretically demonstrated for the mass region 5 x 10(3) < m < 10(5) Da, under conditions where the electric field in the mirror increases by approximately 20% during a time interval of several hundred microseconds. Copyright 2000 John Wiley & Sons, Ltd.
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