Optimazation of the parameters involved in the photochemical doping of Si with a pulsed ArF excimer laser

✍ Scribed by F. Foulon; A. Slaoui; E. Fogarassy; R. Stuck; C. Fuchs; P. Siffert

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 444 KB
• Volume: 36
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(89)90933-1