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Optimal phase mask for fiber Bragg grating fabrication

✍ Scribed by Qiu, Y.; Sheng, Y.; Beaulieu, C.


Book ID
115369787
Publisher
Optical Society of America
Year
1999
Tongue
English
Weight
148 KB
Volume
17
Category
Article
ISSN
0733-8724

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We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift.