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Optimal control of the wafer temperatures in diffusion/LPCVD reactors

✍ Scribed by H. De Waard; W.L. De Koning

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
873 KB
Volume
28
Category
Article
ISSN
0005-1098

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✦ Synopsis

Although direct measurements of the wafer temperatures are not available for on-line control of the film growth in semiconductor batch production processes, a model derived from first principles permits the use of an on-line observer in an LQG controller structure.

πŸ“œ SIMILAR VOLUMES

Studies in optimizationβ€”IX The questing
Studies in optimizationβ€”IX The questing control of a two phase reactor
✍ R.N. Schindler; R. Aris πŸ“‚ Article πŸ“… 1967 πŸ› Elsevier Science 🌐 English βš– 581 KB

The application of the Li-Box-Chanmugam technique of adaptive optimization to a two phase reactor is here considered. The maximum yield is sought and held by the controller by adjusting the reactor temperature and the ratio of the two phases. Sinusoidal questing perturbations are made in the coolant