Optical–thermal simulation applied to the study of the pattern effects induced by the sub-melt laser anneal process in advanced CMOS technologies

✍ Scribed by A. Colin; P. Morin; F. Cacho; H. Bono; R. Beneyton; D. Mathiot; E. Fogarassy

• Publisher: Springer
• Year: 2011
• Tongue: English
• Weight: 678 KB
• Volume: 104
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-011-6467-0