✦ LIBER ✦
Simulation of the sub-melt laser anneal process in 45 CMOS technology—Application to the thermal pattern effects
✍ Scribed by A. Colin; P. Morin; F. Cacho; H. Bono; R. Beneyton; M. Bidaud; D. Mathiot; E. Fogarassy
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 419 KB
- Volume
- 154-155
- Category
- Article
- ISSN
- 0921-5107
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