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Optical properties of the HfO2 −xNxand TiO2 −xNxfilms prepared by ion beam sputtering

✍ Scribed by V. V. Atuchin; V. N. Kruchinin; A. V. Kalinkin; V. Sh. Aliev; S. V. Rykhlitskiĭ; V. A. Shvets; E. V. Spesivtsev

No coin nor oath required. For personal study only.

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