Optical near-field lithography in chalcogenide films
β Scribed by Salman Noach; Michael Manevich; Naftali P. Eisenberg; Dan Davidov; Matvey Klebanov; Victor Lyubin
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 226 KB
- Volume
- 28
- Category
- Article
- ISSN
- 0925-3467
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Surface plasmon lithography using embedded-amplitude masks has received considerable attention in recent times for its ability to produce high density features with resolution beyond diffraction limit. However plasmon damping caused due to intrinsic metal absorption restricts the achievable aspect r
## Abstract The fabrication of highβresolution nanostructures in both poly(__p__βphenylene vinylene), PPV, and a crosslinkable derivative of poly(9,9β²βdioctylfluorene), F8, using scanning nearβfield optical lithography, is reported. The ability to draw complex, reproducible structures with 65000 pi