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Optical dispersion relations for amorphous semiconductors and amorphous dielectrics

โœ Scribed by Forouhi, A. R.; Bloomer, I.


Book ID
118046062
Publisher
The American Physical Society
Year
1986
Tongue
English
Weight
849 KB
Volume
34
Category
Article
ISSN
1098-0121

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โœฆ Synopsis


An expression for the imaginary part, k, of the complex index of refraction, N = n -ik, for amor- phous materials is derived as a function of photon energy E: k{E)=A(E -Eg) /(E -8E+C)

where A, 8, and C are positive nonzero constants characteristic of the medium such that 4 C 8 & 0 Eg represents the optical energy band gap. The real part, n, of the complex index of refraction is then determined to be n(E)=n( 00)+(80E+Co)/ (E2 -8E+C) using Kramers- Kronig analysis, where 8o and Co are constants that depend on A, 8, C"and Eg, and n(00) is a constant greater than unity. Excellent agreement was found between these formulas and experimen- tally measured and published values of n and k of amorphous silicon, hydrogenated amorphous sil- icon, amorphous silicon nitride, and titanium dioxide.


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