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Optical characterization of thin thermal oxide films on copper by ellipsometry

✍ Scribed by H. Derin; K. Kantarli

Publisher
Springer
Year
2002
Tongue
English
Weight
114 KB
Volume
75
Category
Article
ISSN
1432-0630

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Optical Characterization of Silicon Oxyn
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✍ Yi-Ming Xiong; Paul G. Snyder; John A. Woollam; G. A. Al-Jumaily; F. J. Gagliard πŸ“‚ Article πŸ“… 1992 πŸ› John Wiley and Sons 🌐 English βš– 424 KB

## Abstract Silicon oxynitride (SiO~x~ N~y~) thin films were deposited on silicon substrates by ion‐assisted deposition. Variable angle spectroscopic ellipsometry (VASE) was used to optically characterize the deposited film properties, such as layer thickness and composition, film surface and inter