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Optical and excitonic properties of ZnO films

✍ Scribed by M. Mihailovic; A.-L. Henneghien; S. Faure; P. Disseix; J. Leymarie; A. Vasson; D.A. Buell; F. Semond; C. Morhain; J. Zùñiga Pérez


Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
396 KB
Volume
31
Category
Article
ISSN
0925-3467

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ZnO films were grown on Si(100) and quartz substrates by inductively coupled plasma assisted chemical vapor deposition (ICP-CVD), using metal organic DEZ (diethlyzinc), and a gas mixture of Ar and O 2 . The process temperature ranged between room temperature and 400 °C. ZnO films showed both p-and n