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On the role of thermal gradient related stress in intrinsic defect formation during single crystal silicon growth from the melt

✍ Scribed by Jan Vanhellemont

Book ID: 116630142
Publisher: Elsevier Science
Year: 2012
Tongue: English
Weight: 362 KB
Volume: 352
Category: Article
ISSN: 0022-0248
DOI: 10.1016/j.jcrysgro.2011.12.001

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