On the problem of measurement of thickness of epitaxial semiconductor films on semiconductor substrates by the ellipsometric method in the far infrared region: K K Svitashev et al, Mikroelektronika, 2 (5), 1973, 454–460 (in Russian)

• Publisher: Elsevier Science
• Year: 1975
• Tongue: English
• Weight: 189 KB
• Volume: 25
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(75)91191-4