The diffusion-induced recrystallization, DIR, in NiO reported by Parthasarathy and Shewmon, has been investigated by means of scanning electron microscopy and EDS analysis. High purity metallic nickel was oxidized to NiO in air at 1200Β°C for 24 h and subsequently annealed with metallic nickel in vac
β¦ LIBER β¦
On the nucleation of diffusion induced recrystallization
β Scribed by Fu-Sen Chen; A.H. King
- Book ID
- 116062765
- Publisher
- Elsevier Science
- Year
- 1987
- Weight
- 764 KB
- Volume
- 21
- Category
- Article
- ISSN
- 0036-9748
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