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On the mechanism of chemical vapor deposition of Ta2O5 from TaCl5 and H2O. An ab initio study of gas phase reactions

✍ Scribed by M Siodmiak; G Frenking; A Korkin

Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
168 KB
Volume
3
Category
Article
ISSN
1369-8001

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