On the mechanism of C2F5I photolysis in the presence of trifluoroacetic acid
โ Scribed by S. I. Lane; E. V. Oexler; E. H. Staricco
- Publisher
- John Wiley and Sons
- Year
- 1991
- Tongue
- English
- Weight
- 500 KB
- Volume
- 23
- Category
- Article
- ISSN
- 0538-8066
No coin nor oath required. For personal study only.
โฆ Synopsis
The photolysis of C2F51 with CF3COOH in the temperature range 473-533 K was studied in the gas phase.
Evidence is presented that supports a complex mechanism for the formation of CzFsH through the H-atom abstraction reaction from CFaCOOH by CzFs radicals as well as the participation of 1(2P*,2).
๐ SIMILAR VOLUMES
The inlrared emission of l\*(\*P1& aloms at 1315 pm has been observed m a fast-flow reactor from the renct~on of F atoms with iodine mokules. F atoms were produced either in an electronic discharge by dl-ation of a Iluorinakd compound or tn a mmbustor from rhc reaction of CA-F2 and Dz with helium di
Values of 4 have also come from chemical detection work [ 1 0,l 1 ] , using the molecules NOCl and ICI in reaction with I-For tz-C,F,I, values approaching unity were obtained at both ends of the wavelength range 260-3 15 nm, with a minimum of 9 = 0.78 at 285 nm-Measurements of gain characteristics i