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Observation of Precursor Control over Film Stoichiometry during the Chemical Vapor Deposition of Amorphous Ti x Si 1- x O 2 Films

✍ Scribed by Smith, Ryan C.; Taylor, Charles J.; Roberts, Jeffrey; Campbell, Stephen A.; Tiner, Mike; Hegde, Rama; Hobbs, Christopher; Gladfelter, Wayne L.

Book ID: 126132915
Publisher: American Chemical Society
Year: 2000
Tongue: English
Weight: 37 KB
Volume: 12
Category: Article
ISSN: 0897-4756
DOI: 10.1021/cm0003222

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