Observation of non-radiative de-excitation processes in silicon nanocrystals
β Scribed by Knights, A. P. ;Milgram, J. N. ;Wojcik, J. ;Mascher, P. ;Crowe, I. ;Sherliker, B. ;Halsall, M. P. ;Gwilliam, R. M.
- Book ID
- 105365310
- Publisher
- John Wiley and Sons
- Year
- 2009
- Tongue
- English
- Weight
- 247 KB
- Volume
- 206
- Category
- Article
- ISSN
- 0031-8965
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β¦ Synopsis
Abstract
We describe the impact of nonβradiative deβexcitation mechanisms on the optical emission from silicon nanocrystals formed in SiO~2~. Auger excitation via free carriers deliberately introduced through phosphorus ion implantation, shows a monotonic increase with increasing phosphorus concentration which can be modelled adequately using a simple statistical approach. We also report a reduction in nanocrystal luminescence intensity with increasing exposure to UV radiation and suggest this phenomenon results from the introduction of nonβradiative defects in the Si/SiO~2~ network. The effect of UV radiation varies significantly depending on the sample preparation. (Β© 2009 WILEYβVCH Verlag GmbH & Co. KGaA, Weinheim)
π SIMILAR VOLUMES
There are some evidences that Er related optically active centers in silicon form donors with binding energy about 150-250 meV, and the excitation of erbium occurs in a result of Auger recombination process of the electron bound to the donor and a free hole or bound exciton. It is supposed that ther