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Numerical Analysis of a Mask Type Stereolithography Process Using a Dynamic Finite-Element Method

✍ Scribed by Y.-M. Huang; C.-P. Jiang

Publisher: Springer
Year: 2003
Tongue: English
Weight: 261 KB
Volume: 21
Category: Article
ISSN: 0268-3768
DOI: 10.1007/s00170-002-1388-x

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