Novel technique for preparing porous silicon
β Scribed by Hummel, R. E.; Chang, Sung-Sik
- Book ID
- 121702133
- Publisher
- American Institute of Physics
- Year
- 1992
- Tongue
- English
- Weight
- 639 KB
- Volume
- 61
- Category
- Article
- ISSN
- 0003-6951
- DOI
- 10.1063/1.108331
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A porous layer is generated by electrochemical dissolution of silicon in HF. This new material has some very interesting applications in microstructuring, sensorics, microelectronics and microoptics. The etching process and the morphology of porous silicon are described. Possible applications are di
By means of electrochemical treatment, crystalline silicon can be permeated with tiny, nanostructured pores that entirely change the characteristics and properties of the material. One prominent example of this can be seen in the interaction of porous silicon with living cells, which can be totall