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Novel photoresist design based on electrophilic aromatic substitution

✍ Scribed by B. Reck; R. D. Allen; R. J. Twieg; C. G. Willson; S. Matuszczak; H. D. H. Stover; N. H. Li; J. M. J. Fréchet

Publisher
Society for Plastic Engineers
Year
1989
Tongue
English
Weight
537 KB
Volume
29
Category
Article
ISSN
0032-3888

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