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Novel materials for the semiconductor industry, deposited using a rapid thermal chemical vapour deposition system

โœ Scribed by J.H. Montgomery; F.H. Ruddell; D.W. McNeill; B.M. Armstrong; H.S. Gamble

Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
585 KB
Volume
33
Category
Article
ISSN
0924-0136

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A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar