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Novel Doping Process for Ultra-Shallow Junction: Rapid Vapor-Phase Direct Doping (RVD)

✍ Scribed by Kiyota, Yukihiro; Onai, Takahiro; Nakamura, Tohru; Inada, Taroh; Kuranouchi, Atsushi; Hirano, Yasuaki

No coin nor oath required. For personal study only.

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