Characteristics of solid-phase diffused ultra-shallow junction using phosphorus doped silicon oxide films for fabrication of sub-100 nm SOI MOSFET

✍ Scribed by Won-ju Cho; Kiju Im; Jong-Heon Yang; Jihun Oh; Seongjae Lee; Kyoungwan Park

• Book ID: 111590096
• Publisher: Springer
• Year: 2004
• Tongue: English
• Weight: 73 KB
• Volume: 39
• Category: Article
• ISSN: 0022-2461
• DOI: 10.1023/b:jmsc.0000016194.81327.b0