Novel deposition technique of Er-doped a-Si:H combining catalytic chemical vapor deposition and pulsed laser-ablation

✍ Scribed by Atsushi Masuda; Joe Sakai; Haruo Akiyama; Osamu Eryu; Kenshiro Nakashima; Hideki Matsumura

• Book ID: 117150311
• Publisher: Elsevier Science
• Year: 2000
• Tongue: English
• Weight: 160 KB
• Volume: 266-269
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(99)00780-2