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Novel degradation model of MOSFET thin gate oxide induced by VUV photons during high density plasma oxide deposition

โœ Scribed by Kim, Moojin; Lee, Jeongyun; Kim, Dongkwon; Min, Gyungjin

Book ID
123200810
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
651 KB
Volume
228
Category
Article
ISSN
0257-8972

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