Nitric acid-based slurry with citric acid as an inhibitor for copper chemical mechanical polishing

✍ Scribed by T.C Hu; S.Y Chiu; B.T Dai; M.S Tsai; I.-C Tung; M.S Feng

• Book ID: 114194723
• Publisher: Elsevier Science
• Year: 1999
• Tongue: English
• Weight: 118 KB
• Volume: 61
• Category: Article
• ISSN: 0254-0584
• DOI: 10.1016/s0254-0584(99)00138-8