Nickel electrodeposition on different metallic substrates
✍ Scribed by E. Gómez; R. Pollina; E. Vallés
- Publisher
- Elsevier
- Year
- 1995
- Tongue
- English
- Weight
- 929 KB
- Volume
- 386
- Category
- Article
- ISSN
- 1572-6657
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A transmission electron microscopy study has been made of the growth of nickel films electrodeposited from a Watts bath at a cd of 1 mA/cms on to vapour-deposited (100) copper films. Average film thicknesses in the range 75-250 A have been studied both in position on the substrate and as separate s
**Thin films of organic metals** generally exhibit activated conductivity caused by intergrain conduction barriers. One of the few examples of thin films showing truly metallic character is TTF[Ni(dmit)~2~]~2~. Films electrodeposited on silicon substrates remain metallic down to 12 K in spite of the