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Metallic Thin Films of TTF[Ni(dmit)2]2 by Electrodeposition on (001)-Oriented Silicon Substrates

✍ Scribed by D. de Caro; J. Fraxedas; C. Faulmann; I. Malfant; J. Milon; J.-F. Lamère; V. Collière; L. Valade


Publisher
John Wiley and Sons
Year
2004
Tongue
English
Weight
221 KB
Volume
16
Category
Article
ISSN
0935-9648

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✦ Synopsis


Thin films of organic metals generally exhibit activated conductivity caused by intergrain conduction barriers. One of the few examples of thin films showing truly metallic character is TTF[Ni(dmit)~2~]~2~. Films electrodeposited on silicon substrates remain metallic down to 12 K in spite of their polycrystalline morphology (see Figure).