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Next-generation lithography for 22 and 16 nm technology nodes and beyond

✍ Scribed by Banqiu Wu

Book ID: 107359897
Publisher: Science in China Press (SCP)
Year: 2011
Tongue: English
Weight: 710 KB
Volume: 54
Category: Article
ISSN: 1674-733X
DOI: 10.1007/s11432-011-4227-6

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