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New organometallic route to vanadium carbonitride thin films

✍ Scribed by Laurent, François; Michel, Philippe; Feurer, Roselyne; Morancho, Roland; Valade, Lydie; Choukroun, Robert; Cassoux, Patrick


Book ID
111865721
Publisher
Royal Society of Chemistry
Year
1993
Tongue
English
Weight
546 KB
Volume
3
Category
Article
ISSN
0959-9428

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Ceramic thin films containing titanium, vanadium, carbon, oxygen and nitrogen were obtained on steel substrates at 873 K, under nitrogen and helium gases and at low pressure, by chemical vapor deposition (CVD) from two organometallic precursors, CpTiCl 2 N(SiMe 3 ) 2 and Cp 2 VMe 2 (Cp, cyclopentadi