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Neutralization of effluent water from the chemical polishing of crystal ware

✍ Scribed by V. G. Solonetskii; L. P. Kostyuchenko; N. A. Senkevich


Publisher
Springer US
Year
1981
Tongue
English
Weight
332 KB
Volume
38
Category
Article
ISSN
0361-7610

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On the mechanism of chemical polishing o
✍ D. Zach; Dr. habil. H. LΓΆwe πŸ“‚ Article πŸ“… 1983 πŸ› John Wiley and Sons 🌐 English βš– 283 KB πŸ‘ 2 views

## On the Mechanism of Chemical Polishing of GaAs Crystals In order to establish reproducible conditions for chemical lap polishing of GaAs with NaOCl solutions, containing also OH-and CO:--ions, the mechanism of dissolution was investigated using the rotating disk arrangement. I n solutions with