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Negative ion behavior in single- and dual-frequency plasma etching reactors: Particle-in-cell/Monte Carlo collision study

โœ Scribed by Georgieva, V.; Bogaerts, A.


Book ID
119973095
Publisher
The American Physical Society
Year
2006
Tongue
English
Weight
284 KB
Volume
73
Category
Article
ISSN
1063-651X

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