Nb redeposition on Si during plasma etching of Nb/SiO2/Si layers investigated by RBS

✍ Scribed by D. Schelle; Prof. Dr. H.-J. Tiller

• Publisher: John Wiley and Sons
• Year: 1987
• Tongue: English
• Weight: 289 KB
• Volume: 22
• Category: Article
• ISSN: 0232-1300
• DOI: 10.1002/crat.2170220804