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National intercomparison exercise, ZH-A for the measurement of hafnium and zirconium in zirconium ores

✍ Scribed by N. Siddique; S. Waheed; A. Rahman; S. Ahmad


Book ID
106439555
Publisher
Springer
Year
2006
Tongue
English
Weight
257 KB
Volume
268
Category
Article
ISSN
1588-2780

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Chemical vapour deposition of the oxides
✍ Ryan C. Smith; Tiezhong Ma; Noel Hoilien; Lancy Y. Tsung; Malcolm J. Bevan; Luig πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 340 KB πŸ‘ 3 views

A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standar