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Narrow track magnetic head fabricated by ion-etching method

โœ Scribed by Nakanishi, T.; Toshima, T.; Yanagisawa, K.; Tsuzuki, N.


Book ID
114644750
Publisher
IEEE
Year
1979
Tongue
English
Weight
535 KB
Volume
15
Category
Article
ISSN
0018-9464

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Highly (0 0 2)-oriented AlN film was deposited on n-type (1 0 0)-oriented silicon substrates by the radio frequency magnetron sputtering method. An individual AlN cone with high aspect ratio was fabricated by the focused ion-beam (FIB) etching process in the surface of an as-formed AlN film. This et