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Nanostructured porous silicon as thick electrical insulator for radio-frequency applications

✍ Scribed by Porcher, A. ;Remaki, B. ;Populaire, C. ;Barbier, D.


Book ID
105364305
Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
336 KB
Volume
204
Category
Article
ISSN
0031-8965

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✦ Synopsis


Abstract

Nanostructured porous silicon layers are studied for the purpose of their use as electrical insulators between mono‐crystalline silicon substrates and integrated planar radio frequency (rf) devices. The capacitive nature of the layers with a tangent loss lower than 10^–2^ is demonstrated in the 10^5^–10^9^ Hz range by means of complex impedance measurements and rf regime experiments on micro LC resonant circuits. Finally, the insulating capabilities of nanostructured porous silicon were evaluated using numerical simulations combined with our experimental data. A minor contribution of the porous silicon residual conductance to the rf energy loss is found. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)


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