๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Nanostructured one-and three-dimensional magnetophotonic crystals based on porous silicon and artificial opals

โœ Scribed by F. Yu. Sychev; R. V. Kapra; I. A. Moshnina; A. A. Ezhov; T. V. Murzina; O. A. Aktsipetrov; S. F. Kaplan; D. A. Kurdyukov; V. G. Golubev; M. A. Bader; G. Marowsky

Book ID
111500446
Publisher
Allerton Press Inc
Year
2007
Tongue
English
Weight
146 KB
Volume
71
Category
Article
ISSN
1062-8738

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

One-dimensional magnetophotonic crystals
One-dimensional magnetophotonic crystals based on double-layer Bi-substituted iron garnet films
โœ V. N. Berzhansky; A. N. Shaposhnikov; A. R. Prokopov; A.V. Karavainikov; T. V. M ๐Ÿ“‚ Article ๐Ÿ“… 2011 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 695 KB

## Abstract In the present work the fabrication process and properties of periodic oneโ€dimensional magnetophotonic crystal GGG (111)/M1/SiO~2~/[M2/M1/SiO~2~]^4^ in which as magnetic active layers were used doubleโ€layer Biโ€substituted iron garnet films with high (Bi~2.8~Y~0.2~Fe~5~O~12~ : M1) and lo

Advanced etching of silicon based on dee
Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures
โœ F. Marty; L. Rousseau; B. Saadany; B. Mercier; O. Franรงais; Y. Mita; T. Bourouin ๐Ÿ“‚ Article ๐Ÿ“… 2005 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 483 KB

Different processes involving an inductively coupled plasma reactor are presented either for deep reactive ion etching or for isotropic etching of silicon. On one hand, high aspect ratio microstructures with aspect ratio up to 107 were obtained on sub-micron trenches. Application to photonic MEMS is