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Nanocrystallized SnO2 thin films deposited on Si and LaAlO3 substrates by pulsed-MOCVD technique for electrochemical applications

✍ Scribed by Drevet, R.; Legros, C.; Berardan, D.; Ribot, P.; Chaussé, A.; Andrieux, M.

Book ID: 123507466
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 897 KB
Volume: 230
Category: Article
ISSN: 0257-8972
DOI: 10.1016/j.surfcoat.2013.06.033

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