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Mössbauer studies on the changes of the sites of implanted Te and Sb in silicon

✍ Scribed by G. Weyer; B. I. Deutch; A. Nylandsted-Larsen; H. L. Nielsen


Book ID
112460367
Publisher
Springer
Year
1976
Tongue
English
Weight
52 KB
Volume
2
Category
Article
ISSN
0304-3843

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