Mössbauer spectroscopy study of the thermal annealing behavior of very low and very high dose Co-implanted Si

✍ Scribed by G. Langouche; M. De Potter; I. Dézsi; M.F. Wu; A. Vantomme

• Book ID: 113279688
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 354 KB
• Volume: 37-38
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(89)90220-6