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Multilayer dielectric materials of SiOX/Ta2O5/SiO2 for temperature-stable diode lasers

โœ Scribed by A.K. Chu; C.J. Lin; W.H. Cheng


Book ID
113300559
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
319 KB
Volume
42
Category
Article
ISSN
0254-0584

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Ta2O5/SiO2 multilayered thin film on Si
โœ Kim, Kyung Joong; Moon, Dae Won ๐Ÿ“‚ Article ๐Ÿ“… 1998 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 406 KB

A delta oxide multilayered thin รlm is proposed as a new reference material for SIMS depth proรling. This material is composed of seven thick layers of 18 nm separated by 1 nm delta layers. The surface of Ta 2 O 5 SiO 2 the thin รlm was very ร‘at and all the interfaces were sharp according to atomic