A new hole surface scattering model for FBMC simulations is presented for unstrained Si and biaxially strained Si/SiGe PMOSFETs. The new scattering model was developed for quantum corrected spatial hole charge distributions at the Si/SiO 2 interface, where the quantum correction is based on the impr
✦ LIBER ✦
Monte Carlo simulations of Ge segregation in strained Si and SiGe alloys
✍ Scribed by MatsI. Larsson; GöranV. Hansson
- Publisher
- Elsevier Science
- Year
- 1993
- Weight
- 77 KB
- Volume
- 291
- Category
- Article
- ISSN
- 0167-2584
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