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Dose loss and segregation of boron and arsenic at the Si/SiO2 interface by atomistic kinetic Monte Carlo simulations

✍ Scribed by J.E. Rubio; M. Jaraiz; I. Martin-Bragado; P. Castrillo; R. Pinacho; J. Barbolla


Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
279 KB
Volume
124-125
Category
Article
ISSN
0921-5107

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