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Monitoring of Thin Film Thickness by Ellipsometry

โœ Scribed by Sirohi, R. S.


Book ID
115320717
Publisher
The Optical Society
Year
1969
Tongue
English
Weight
825 KB
Volume
8
Category
Article
ISSN
1559-128X

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An optical thin film thickness monitor
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A modified technique for optical monitoring of the quarter-wave stacks of dielectric materials, utilising the principle of wavelength modulation and phase sensitive detection, is suggested. The accuracy and the sensitivity of the method is very high and can be used for making the coating process sel