Molecular dynamics simulation of cluster-ion fragmentation
β Scribed by J.D. Weinstein; R.T. Fisher; S. Vasanawala; M.H. Shapiro; T.A. Tombrello
- Book ID
- 113286066
- Publisher
- Elsevier Science
- Year
- 1994
- Tongue
- English
- Weight
- 712 KB
- Volume
- 88
- Category
- Article
- ISSN
- 0168-583X
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Cluster ion implantation is a useful technique for manufacturing ultra-shallow-junction. In order to investigate the depth and lateral distribution as well as cluster dissociation, we performed a molecular dynamics simulation that injects 200-500 eV/atom boron cluster into single crystal silicon. Th
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